Magnetron sputter depozition targets
Sputtering target materials for magnetron deposition — is an in-process metallic material, consisting of one or several components in the form of squared or round plates. They are utilized in powerful microwave appliances and field-effect transistors.
| Material | Composition, % | |||
| Al - base material | ||||
| Si | Cu | Ti | Ni | |
| Al | - | - | - | - |
| Al-Si | 0.5; 1; 1,5 | - | - | - |
| Al-Cu | 4 | - | - | |
| Al-Ti | - | - | - | |
| Al-Ni | - | - | 1 | |
| Al-Si-Ni | 1,5 | 4 | - | - |
| Al-Si-Ti | 1,5 | - | 1,5 | - |